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Effect of oxygen on boron doping in chemical vapor deposition of diamond as deduced from....

Authors :
Ruan, J.
Kobashi, K.
Source :
Applied Physics Letters; 4/13/1992, Vol. 60 Issue 15, p1884, 3p, 3 Graphs
Publication Year :
1992

Abstract

Investigates the effect of oxygen on boron doping in diamond thin films. Growth of diamond film using microwave-plasma enhanced chemical vapor deposition; Application of cathodoluminescence for analysis of deposited film; Characterization of film by scanning electron microscopy and Raman scattering; Variation of boron concentration in film doped with oxygen.

Subjects

Subjects :
OXYGEN
DIAMOND thin films

Details

Language :
English
ISSN :
00036951
Volume :
60
Issue :
15
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4250504
Full Text :
https://doi.org/10.1063/1.107143