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Influence of target-substrate angle on the elemental concentration of c-axis...

Authors :
Pugel, D. E.
Greene, L. H.
Source :
Applied Physics Letters; 9/13/1999, Vol. 75 Issue 11, p1589, 3p, 6 Black and White Photographs, 7 Graphs
Publication Year :
1999

Abstract

Studies the influence of target-substrate angle on the elemental concentration of thin films. Indications of the thermalization processes in sputtering; Common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements and conventional Rutherford backscattering spectrometry.

Subjects

Subjects :
THIN films
ELECTRON microscopy

Details

Language :
English
ISSN :
00036951
Volume :
75
Issue :
11
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
4211948
Full Text :
https://doi.org/10.1063/1.124763