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High resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin film surfaces.
- Source :
- Journal of Applied Physics; 11/1/2000, Vol. 88 Issue 9, p5180, 8p, 1 Diagram, 3 Charts, 6 Graphs
- Publication Year :
- 2000
-
Abstract
- Reports on findings of a high resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin films surfaces. Plasma oxidation n-type doping in the near surface region; Shift to low binding energy for both core and valence band photoemission features; Fixed conduction band of the indium-tin-oxide.
- Subjects :
- PHOTOEMISSION
PLASMA gases
INDIUM
THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 88
- Issue :
- 9
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 3745672
- Full Text :
- https://doi.org/10.1063/1.1312847