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Wafer-scale production of carbon nanofiber probes.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Mar2009, Vol. 27 Issue 2, p975-979, 5p, 1 Color Photograph, 2 Black and White Photographs, 1 Diagram, 4 Graphs
- Publication Year :
- 2009
-
Abstract
- The 4 in. wafer-scale production of probes tipped with single carbon nanofibers (CNF probes) for scanning probe microscope was achieved by an Ar<superscript>+</superscript>-ion-irradiation method. For the wafer-scale production, an arrangement of commercial-type Si cantilevers (tetrahedral Si tips), onto which single CNFs are grown, was optimized to contain 288 cantilevers in a 4 in. wafer. The ion-induced CNFs were then batch grown in the wafer scale. Scanning electron microscope observation of 50 of 288 probes randomly selected revealed that the CNFs were linear shaped, ∼400 nm in average length and ∼9 nm in average radius, and that ∼80% of the probes batch grown were suitable for practical use as qualified probes. Atomic force microscope image of a densely distributed plastic nanocolumn array obtained by the batch-grown CNF probe was clearer and less distorted, compared to that attained by a conventional Si probe. Thus, the ion-irradiation method opened up new route for the wafer-scale production of CNF probes for practical daily use. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 10711023
- Volume :
- 27
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
- Publication Type :
- Academic Journal
- Accession number :
- 37280149
- Full Text :
- https://doi.org/10.1116/1.3043464