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Self-extrusion of Te nanowire from Si–Sb–Te thin films.
- Source :
- Applied Physics Letters; 11/3/2008, Vol. 93 Issue 18, p183113, 3p, 1 Color Photograph, 8 Black and White Photographs, 1 Diagram, 1 Graph
- Publication Year :
- 2008
-
Abstract
- A crystallized Si<subscript>2</subscript>Sb<subscript>2</subscript>Te<subscript>5</subscript> thin film was observed to extrude single-crystalline [0001] oriented tellurium nanowires at room temperature. The single crystalline Te nanowires nucleation and extruded outgrowth can be greatly accelerated by electron-beam-illumination (EBI) in a transmission electron microscope by an order as high as four. The EBI-enhanced outgrowth speed of Te nanowires is a function of electron beam flux and can be described as v=k ln(J+m). This Te nanowires self-outflow phenomenon comes from a decomposition process of the Si<subscript>2</subscript>Sb<subscript>2</subscript>Te<subscript>5</subscript> matrix and provides an interesting model and mechanism of the nanowires’ growth, which is distinctive to the vapor-liquid-solid (VLS) mechanism. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 93
- Issue :
- 18
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 35279169
- Full Text :
- https://doi.org/10.1063/1.3013513