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Self-extrusion of Te nanowire from Si–Sb–Te thin films.

Authors :
Cheng, Y.
Han, X. D.
Liu, X. Q.
Zheng, K.
Zhang, Z.
Zhang, T.
Song, Z. T.
Liu, B.
Feng, S. L.
Source :
Applied Physics Letters; 11/3/2008, Vol. 93 Issue 18, p183113, 3p, 1 Color Photograph, 8 Black and White Photographs, 1 Diagram, 1 Graph
Publication Year :
2008

Abstract

A crystallized Si<subscript>2</subscript>Sb<subscript>2</subscript>Te<subscript>5</subscript> thin film was observed to extrude single-crystalline [0001] oriented tellurium nanowires at room temperature. The single crystalline Te nanowires nucleation and extruded outgrowth can be greatly accelerated by electron-beam-illumination (EBI) in a transmission electron microscope by an order as high as four. The EBI-enhanced outgrowth speed of Te nanowires is a function of electron beam flux and can be described as v=k ln(J+m). This Te nanowires self-outflow phenomenon comes from a decomposition process of the Si<subscript>2</subscript>Sb<subscript>2</subscript>Te<subscript>5</subscript> matrix and provides an interesting model and mechanism of the nanowires’ growth, which is distinctive to the vapor-liquid-solid (VLS) mechanism. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
93
Issue :
18
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
35279169
Full Text :
https://doi.org/10.1063/1.3013513