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High mobility electron-conducting thin-film transistors by organic vapor phase deposition.

Authors :
Rolin, C.
Vasseur, K.
Schols, S.
Jouk, M.
Duhoux, G.
Müller, R.
Genoe, J.
Heremans, P.
Source :
Applied Physics Letters; 7/21/2008, Vol. 93 Issue 3, p033305, 3p, 3 Graphs
Publication Year :
2008

Abstract

In this letter, we report on the growth of thin films of N,N<superscript>′</superscript>-ditridecylperylene-3,4,9,10-tetracarboxylic diimide (PTCDI-C<subscript>13</subscript>H<subscript>27</subscript>) by organic vapor phase deposition (OVPD). Uniform films are deposited with a material utilization efficiency of 59±4% and deposition rates up to 15 Å/s. Top-contact transistors based on OVPD-grown PTCDI-C<subscript>13</subscript>H<subscript>27</subscript> show high n-type mobilities (up to 0.3 cm<superscript>2</superscript>/V s) and reproducible characteristics. The influence of deposition parameters on electrical properties is discussed. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
93
Issue :
3
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
33520184
Full Text :
https://doi.org/10.1063/1.2958229