Back to Search Start Over

Xe capillary target for laser-plasma extreme ultraviolet source.

Authors :
Inoue, Takahiro
Okino, Hideyasu
Nica, Petru Edward
Amano, Sho
Miyamoto, Shuji
Mochizuki, Takayasu
Source :
Review of Scientific Instruments; Oct2007, Vol. 78 Issue 10, p105105, 5p, 2 Diagrams, 2 Charts, 6 Graphs
Publication Year :
2007

Abstract

A cryogenic Xe jet system with an annular nozzle has been developed in order to continuously fast supply a Xe capillary target for generating a laser-plasma extreme ultraviolet (EUV) source. The cooling power of the system was evaluated to be 54 W, and the temperature stability was ±0.5 K at a cooling temperature of about 180 K. We investigated experimentally the influence of pressure loss inside an annular nozzle on target formation by shortening the nozzle length. Spraying caused by cavitation was mostly suppressed by mitigating the pressure loss, and a focused jet was formed. Around a liquid-solid boundary, a solid-Xe capillary target (100/70 μm [lowercase_phi_synonym]) was formed with a velocity of <=0.01 m/s. Laser-plasma EUV generation was tested by focusing a Nd:YAG laser beam on the target. The results suggested that an even thinner-walled capillary target is required to realize the inertial confinement effect. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00346748
Volume :
78
Issue :
10
Database :
Complementary Index
Journal :
Review of Scientific Instruments
Publication Type :
Academic Journal
Accession number :
27420453
Full Text :
https://doi.org/10.1063/1.2800768