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Bonding statistics and electronic structure of novel Si–B–C–N materials: Ab initio calculations and experimental verification.
- Source :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Sep2007, Vol. 25 Issue 5, p1411-1416, 6p, 1 Diagram, 2 Charts, 3 Graphs
- Publication Year :
- 2007
-
Abstract
- Amorphous silicon-boron-carbon-nitrogen alloys were deposited by reactive magnetron sputtering, and their bonding statistics and electronic structure were investigated using a combined approach of experiment and molecular dynamics simulations. The authors show a difference between Si-based and C-based Si–B–C–N networks, and investigate coordination numbers and behavior of individual atom types. Furthermore, the authors calculate electronic structure and photoconductivity of the materials. The authors find that both a higher Si/C ratio and an addition of hydrogen increase a band gap of the materials. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07342101
- Volume :
- 25
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
- Publication Type :
- Academic Journal
- Accession number :
- 26469934
- Full Text :
- https://doi.org/10.1116/1.2764081