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Polycrystalline Ba0.6Sr0.4TiO3 thin films on r-plane sapphire: Effect of film thickness on strain and dielectric properties.

Authors :
Fardin, E. A.
Holland, A. S.
Ghorbani, K.
Akdogan, E. K.
Simon, W. K.
Safari, A.
Wang, J. Y.
Source :
Applied Physics Letters; 10/30/2006, Vol. 89 Issue 18, p182907, 3p, 3 Graphs
Publication Year :
2006

Abstract

Polycrystalline Ba<subscript>0.6</subscript>Sr<subscript>0.4</subscript>TiO<subscript>3</subscript> (BST) films grown on r-plane sapphire exhibit strong variation of in-plane strain over the thickness range of 25–400 nm. At a critical thickness of ∼200 nm, the films are strain relieved; in thinner films, the strain is tensile, while compressive strain was observed in the 400 nm film. Microwave properties of the films were measured from 1 to 20 GHz by the interdigital capacitor method. A capacitance tunability of 64% was observed in the 200 nm film, while thinner films showed improved Q factor. These results demonstrate the possibility of incorporating frequency agile BST-based devices into the silicon on sapphire process. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
89
Issue :
18
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
23073662
Full Text :
https://doi.org/10.1063/1.2374810