Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition.

MLA

Byungwhan Kim, et al. “Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition.” Plasma Chemistry & Plasma Processing, vol. 24, no. 1, Mar. 2004, pp. 29–40. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edb&AN=22136620&authtype=sso&custid=ns315887.

APA

Byungwhan Kim, Sungmo Kim, & Wan-Shick Hong. (2004). Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition. Plasma Chemistry & Plasma Processing, 24(1), 29–40.

Chicago

Byungwhan Kim, Sungmo Kim, and Wan-Shick Hong. 2004. “Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition.” Plasma Chemistry & Plasma Processing 24 (1): 29–40. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edb&AN=22136620&authtype=sso&custid=ns315887.