Ge-dot/Si multilayered structures through Ni-induced lateral crystallization.

We demonstrate a method for fabricating high-quality Ge-dot/Si multilayered structures. High-density self-assembled Ge dots are grown on amorphous Si layer periodically by low-pressure chemical vapor deposition, and then the amorphous Si are crystallized through Ni-based metal-induced lateral crystallization. Optical microscopy, micro-Raman spectroscopy, and electron microscopy observations reveal that the crystallized Si film has large leaflike grains elongated along the lateral crystallization direction, which shows (110) preference. Furthermore, this preference is found to deliver to different Si layers. The strain shift of Ge dots deduced from Raman spectroscopy reveals a formation of a high-quality interface between the crystallized Si and Ge dot. [ABSTRACT FROM AUTHOR]