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Plasma sputtering of an alloyed target for the synthesis of Zr-based metallic glass thin films.
- Source :
- Applied Physics A: Materials Science & Processing; Sep2006, Vol. 84 Issue 4, p465-470, 6p, 2 Diagrams, 3 Charts, 4 Graphs
- Publication Year :
- 2006
-
Abstract
- ZrTiAlCuNi films are deposited by plasma sputtering from an alloyed target prepared by induction – cold crucible melting method. The films are found to be amorphous and exhibit a composition very similar to the target one. It is shown that the amorphous character of the deposits is rather due to the high glass forming ability (GFA) of the Zr-based alloy system, than to the deposition method used. The sputtering process of the alloyed target, composed of mixed Zr-containing phases, has been studied. It appears to be a global process leading to a quasi-congruent transfer of the target elements into the film. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09478396
- Volume :
- 84
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- Applied Physics A: Materials Science & Processing
- Publication Type :
- Academic Journal
- Accession number :
- 21509509
- Full Text :
- https://doi.org/10.1007/s00339-006-3647-4