Plasma sputtering of an alloyed target for the synthesis of Zr-based metallic glass thin films.

ZrTiAlCuNi films are deposited by plasma sputtering from an alloyed target prepared by induction – cold crucible melting method. The films are found to be amorphous and exhibit a composition very similar to the target one. It is shown that the amorphous character of the deposits is rather due to the high glass forming ability (GFA) of the Zr-based alloy system, than to the deposition method used. The sputtering process of the alloyed target, composed of mixed Zr-containing phases, has been studied. It appears to be a global process leading to a quasi-congruent transfer of the target elements into the film. [ABSTRACT FROM AUTHOR]