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Charge-Based Capacitance Measurement for Bias-Dependent Capacitance.

Authors :
Yao-Wen Chang
Hsing-Wen Chang
Tao-Cheng Lu
Ya-Chin King
Wenchi Ting
Yen-Hui Joseph Ku
Chih-Yuan Lu
Source :
IEEE Electron Device Letters; May2006, Vol. 27 Issue 5, p390-392, 3p, 1 Diagram, 3 Graphs
Publication Year :
2006

Abstract

In this letter, charge-based capacitance measurement (CBCM) is applied to characterize bias-dependent capacitances in a CMOS transistor. Due to its special advantage of being free from the errors induced by charge injection, the operation of charge-injection-induced-error-free CBCM allows for the extraction of full-range gate capacitance from the accumulation region to the inversion region and the overlap capacitance of MOSFET devices with submicrometer dimensions. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
07413106
Volume :
27
Issue :
5
Database :
Complementary Index
Journal :
IEEE Electron Device Letters
Publication Type :
Academic Journal
Accession number :
20778606
Full Text :
https://doi.org/10.1109/LED.2006.873368