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Investigation of the a-Si:H films by using thermal and light-induced annealing treatment in atomic hydrogen atmosphere in H-W-ECR CVD system.
- Source :
- Chinese Physics; Jul2005, Vol. 14 Issue 7, p1457-1464, 8p
- Publication Year :
- 2005
Details
- Language :
- English
- ISSN :
- 10091963
- Volume :
- 14
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Chinese Physics
- Publication Type :
- Academic Journal
- Accession number :
- 20151769