Patent Application Titled "Laser Irradiation Apparatus, Laser Irradiation Method, And Method For Manufacturing Semiconductor Device" Published Online (USPTO 20250006498).

A patent application titled "Laser Irradiation Apparatus, Laser Irradiation Method, And Method For Manufacturing Semiconductor Device" was published online by inventors KOBAYASHI, Naoyuki and SATO, Ryosuke, with JSW Aktina System Co. Ltd. as the assignee. The application describes a laser irradiation apparatus and method for activating semiconductor layers in semiconductor devices using a semiconductor laser light source. The invention aims to address cost challenges associated with excimer laser light sources by utilizing semiconductor lasers for efficient semiconductor device manufacturing. [Extracted from the article]