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高温高应变下 Cu / Ta 界面扩散行为的 分子动力学模拟.
- Source :
- Electronic Components & Materials; Oct2024, Vol. 43 Issue 10, p1274-1283, 10p
- Publication Year :
- 2024
-
Abstract
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Details
- Language :
- Chinese
- ISSN :
- 10012028
- Volume :
- 43
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- Electronic Components & Materials
- Publication Type :
- Academic Journal
- Accession number :
- 181838684
- Full Text :
- https://doi.org/10.14106/j.cnki.1001-2028.2024.1525