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Robust van der Waals Metal Mask for Residue‐Free and All‐Solid 2D Material Engineering.

Authors :
Hong, Chengyun
Dat, Vu Khac
Nguyen, Minh Chien
Yu, Woo Jong
Kim, Ji‐Hee
Source :
Advanced Functional Materials; 11/12/2024, Vol. 34 Issue 46, p1-9, 9p
Publication Year :
2024

Abstract

The van der Waals (vdW) contact, characterized by its bondless interactions, opens up exciting possibilities in cutting‐edge mask technology. It enables incredibly close proximity to samples at the atomic level while facilitating non‐destructive engineering. In this study, the concept of a vdW metal mask using the template striped ultra‐flat Ag/Au film is introduced. The probe tip‐assisted metal film transfer under an optical microscope is employed to showcase all‐solid and residue‐free engineering on 2D materials. The robust nature of the vdW metal mask allows for various treatments, including gas, liquid, solid, plasma, and light, making it a universal tool for fabricating 2D material‐based devices and samples with sub‐1 µm resolution, all without the need for lithography technologies. With the superiority in simple sample fabrication, ultra‐clean surfaces, and robustness under harsh conditions, the technique is believed to flourish in the 2D material research field. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
1616301X
Volume :
34
Issue :
46
Database :
Complementary Index
Journal :
Advanced Functional Materials
Publication Type :
Academic Journal
Accession number :
180803009
Full Text :
https://doi.org/10.1002/adfm.202407821