Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses.

MLA

Granados, Eduardo, et al. “Highly Uniform Silicon Nanopatterning with Deep-Ultraviolet Femtosecond Pulses.” Nanophotonics (21928606), vol. 13, no. 22, Sept. 2024, pp. 4079–89. EBSCOhost, https://doi.org/10.1515/nanoph-2024-0240.

APA

Granados, E., Martinez-Calderon, M., Groussin, B., Colombier, J. P., & Santiago, I. (2024). Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses. Nanophotonics (21928606), 13(22), 4079–4089. https://doi.org/10.1515/nanoph-2024-0240

Chicago

Granados, Eduardo, Miguel Martinez-Calderon, Baptiste Groussin, Jean Philippe Colombier, and Ibon Santiago. 2024. “Highly Uniform Silicon Nanopatterning with Deep-Ultraviolet Femtosecond Pulses.” Nanophotonics (21928606) 13 (22): 4079–89. doi:10.1515/nanoph-2024-0240.