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Simulation of mode transitions in capacitively coupled Ar/O2 plasmas.

Authors :
LIU, Xiangmei
刘, 相梅
ZHANG, Shuren
张, 树人
ZHAO, Shuxia
赵, 书霞
LI, Hongying
李, 洪影
REN, Xiaohui
任, 晓辉
Source :
Plasma Science & Technology; Nov2024, Vol. 26 Issue 11, p1-11, 11p
Publication Year :
2024

Details

Language :
English
ISSN :
10090630
Volume :
26
Issue :
11
Database :
Complementary Index
Journal :
Plasma Science & Technology
Publication Type :
Academic Journal
Accession number :
179795079
Full Text :
https://doi.org/10.1088/2058-6272/ad668d