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WS 2 with Controllable Layer Number Grown Directly on W Film.

Authors :
Zhang, Yuxin
Feng, Shiyi
Guo, Jin
Tao, Rong
Liu, Zhixuan
He, Xiangyi
Wang, Guoxia
Wang, Yue
Source :
Nanomaterials (2079-4991); Aug2024, Vol. 14 Issue 16, p1356, 10p
Publication Year :
2024

Abstract

As a layered material with single/multi-atom thickness, two-dimensional transition metal sulfide WS<subscript>2</subscript> has attracted extensive attention in the field of science for its excellent physical, chemical, optical, and electrical properties. The photoelectric properties of WS<subscript>2</subscript> are even more promising than graphene. However, there are many existing preparation methods for WS<subscript>2</subscript>, but few reports on its direct growth on tungsten films. Therefore, this paper studies its preparation method and proposes an innovative two-dimensional material preparation method to grow large-sized WS<subscript>2</subscript> with higher quality on metal film. In this experiment, it was found that the reaction temperature could regulate the growth direction of WS<subscript>2</subscript>. When the temperature was below 950 °C, the film showed horizontal growth, while when the temperature was above 1000 °C, the film showed vertical growth. At the same time, through Raman and band gap measurements, it is found that the different thicknesses of precursor film will lead to a difference in the number of layers of WS<subscript>2</subscript>. The number of layers of WS<subscript>2</subscript> can be controlled by adjusting the thickness of the precursor. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20794991
Volume :
14
Issue :
16
Database :
Complementary Index
Journal :
Nanomaterials (2079-4991)
Publication Type :
Academic Journal
Accession number :
179377045
Full Text :
https://doi.org/10.3390/nano14161356