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Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration.
- Source :
- ACS Applied Nano Materials; 8/9/2024, Vol. 7 Issue 15, p17214-17220, 7p
- Publication Year :
- 2024
-
Abstract
- We manipulated the stacking configuration of a few-layer MoS<subscript>2</subscript> to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS<subscript>2</subscript> islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 25740970
- Volume :
- 7
- Issue :
- 15
- Database :
- Complementary Index
- Journal :
- ACS Applied Nano Materials
- Publication Type :
- Academic Journal
- Accession number :
- 178967042
- Full Text :
- https://doi.org/10.1021/acsanm.4c02834