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Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration.

Authors :
Kim, Jong Hun
Jin, Kyung-Hwan
Jung, Yeonjoon
Lee, Gwan-Hyoung
Baik, Jaeyoon
Kim, Daehyun
Jo, Moon-Ho
Baddorf, Arthur P.
Li, An-Ping
Park, Jewook
Source :
ACS Applied Nano Materials; 8/9/2024, Vol. 7 Issue 15, p17214-17220, 7p
Publication Year :
2024

Abstract

We manipulated the stacking configuration of a few-layer MoS<subscript>2</subscript> to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS<subscript>2</subscript> islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
25740970
Volume :
7
Issue :
15
Database :
Complementary Index
Journal :
ACS Applied Nano Materials
Publication Type :
Academic Journal
Accession number :
178967042
Full Text :
https://doi.org/10.1021/acsanm.4c02834