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Mechanical Integrity and Reinforcement Efficiency of Graphene Grown on Liquid Copper by Chemical Vapor Deposition.

Authors :
Sfougkaris, Ilias
Tsakonas, Christos
Manikas, Anastasios C.
Pastore Carbone, Maria Giovanna
Pavlou, Christos
Groot, Irene M. N.
Saedi, Mehdi
van Baarle, Gertjan J. C.
de Voogd, Marc
Rein, Valentina
Jankowski, Maciej
Konovalov, Oleg V.
Renaud, Gilles
Galiotis, Costas
Source :
Advanced Materials Interfaces; 8/5/2024, Vol. 11 Issue 22, p1-9, 9p
Publication Year :
2024

Abstract

Graphene is a perfect 2D crystal of covalently bonded carbon atoms and constitutes the building block for all graphitic structures. Its superior properties make it an attractive material for a variety of technological applications. However, mass production does not meet the initial expectations. Chemical Vapor Deposition (CVD) is currently the only available method for large‐scale automated production, but the produced graphene sheets suffer from structural and morphological defects that degrade considerably the mechanical and other physical properties of synthesized graphene. Recently, the use of liquid metal catalysts (LMCat) has been proposed as an alternative platform for facile and high‐quality synthesis of single‐crystal graphene. Herein, simultaneous Raman spectroscopy combined with mechanical testing is adopted confirming that the reinforcing efficiency of the LMCat graphene is greatly improved. In fact, the effective Young's modulus of LMCat graphene has been found ≈630 GPa, which is significantly higher than the graphene grown on solid Cu substrate due to differences in the morphology of Cu substrate. Overall, this work paves the way for the development of defect‐free graphene of quality comparable to exfoliated flakes, and this will have a major technological impact for many applications. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21967350
Volume :
11
Issue :
22
Database :
Complementary Index
Journal :
Advanced Materials Interfaces
Publication Type :
Academic Journal
Accession number :
178835477
Full Text :
https://doi.org/10.1002/admi.202400193