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P‐94: Strategies for Adjusting the Flowability of Photoresist from Aspects of Material Composition and Manufacturing Process.
- Source :
- SID Symposium Digest of Technical Papers; Jun2024, Vol. 55 Issue 1, p1751-1754, 4p
- Publication Year :
- 2024
-
Abstract
- The flowability of the photoresist affects the flatness of the color resistance layer during the fabrication process of liquid crystal displays. Color photoresists with poor flowability will increase the usage of photoresists, leading to an increase in panel costs. In this paper, the factors affecting flowability were analyzed in the directions of material and manufacturing and the results were then validated through experiments. Finally, strategies to adjust the flowability of photoresists from aspects of material composition and manufacturing process are summarized. [ABSTRACT FROM AUTHOR]
- Subjects :
- LIQUID crystal displays
PHOTORESISTS
MANUFACTURING processes
Subjects
Details
- Language :
- English
- ISSN :
- 0097966X
- Volume :
- 55
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- SID Symposium Digest of Technical Papers
- Publication Type :
- Academic Journal
- Accession number :
- 178715725
- Full Text :
- https://doi.org/10.1002/sdtp.17911