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P‐94: Strategies for Adjusting the Flowability of Photoresist from Aspects of Material Composition and Manufacturing Process.

Authors :
Feng, Yi
Li, Ji
Zhang, Min
Source :
SID Symposium Digest of Technical Papers; Jun2024, Vol. 55 Issue 1, p1751-1754, 4p
Publication Year :
2024

Abstract

The flowability of the photoresist affects the flatness of the color resistance layer during the fabrication process of liquid crystal displays. Color photoresists with poor flowability will increase the usage of photoresists, leading to an increase in panel costs. In this paper, the factors affecting flowability were analyzed in the directions of material and manufacturing and the results were then validated through experiments. Finally, strategies to adjust the flowability of photoresists from aspects of material composition and manufacturing process are summarized. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
0097966X
Volume :
55
Issue :
1
Database :
Complementary Index
Journal :
SID Symposium Digest of Technical Papers
Publication Type :
Academic Journal
Accession number :
178715725
Full Text :
https://doi.org/10.1002/sdtp.17911