Reactor wall effects in Si–Cl2–Ar atomic layer etching.

MLA

Vella, Joseph R., et al. “Reactor Wall Effects in Si–Cl2–Ar Atomic Layer Etching.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 42, no. 4, July 2024, pp. 1–8. EBSCOhost, https://doi.org/10.1116/6.0003651.

APA

Vella, J. R., Elgarhy, M. A. I., Hao, Q., Donnelly, V. M., & Graves, D. B. (2024). Reactor wall effects in Si–Cl2–Ar atomic layer etching. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 42(4), 1–8. https://doi.org/10.1116/6.0003651

Chicago

Vella, Joseph R., Mahmoud A. I. Elgarhy, Qinzhen Hao, Vincent M. Donnelly, and David B. Graves. 2024. “Reactor Wall Effects in Si–Cl2–Ar Atomic Layer Etching.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 42 (4): 1–8. doi:10.1116/6.0003651.