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P‐1.23: High‐Performance Dual‐Gate a‐IGZO/a‐IZO Thin‐Film Transistors.
- Source :
- SID Symposium Digest of Technical Papers; Apr2024 Suppl 1, Vol. 55 Issue 1, p698-700, 3p
- Publication Year :
- 2024
-
Abstract
- To effectively enhance the mobility without other degradations, such as much negative threshold voltage, this work fabricated the a‐IGZO/a‐IZO heterojunction‐channel TFTs with dual‐gate structure. The fabricated a‐IZO/a‐IGZO with thicker a‐IGZO TFT shows high performance, including high mobility of 54.6 cm2 /Vs, small subthreshold swing of 0.26 V/dec, and good stability under PBTS and NBTIS. [ABSTRACT FROM AUTHOR]
- Subjects :
- TRANSISTORS
AMORPHOUS semiconductors
Subjects
Details
- Language :
- English
- ISSN :
- 0097966X
- Volume :
- 55
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- SID Symposium Digest of Technical Papers
- Publication Type :
- Academic Journal
- Accession number :
- 178132393
- Full Text :
- https://doi.org/10.1002/sdtp.17179