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Elimination of Domain Boundaries Accelerates Diffusion in MOFs by an Order of Magnitude: Monolithic Metal‐Organic Framework Thin Films Epitaxially Grown on Si(111) Substrates.

Authors :
Thissen, Peter
Wohlgemuth, Jonas
Weidler, Peter
Smilgies, Detlef
Heinke, Lars
Schewe, Nils
Koenig, Meike
Krolla, Peter
Wöll, Christof
Source :
Advanced Functional Materials; May2024, Vol. 34 Issue 20, p1-8, 8p
Publication Year :
2024

Abstract

Many properties of the emerging class of metal‐organic frameworks (MOFs) depend crucially on defect concentrations, as in case of other solids. In order to provide reference systems with nearly perfect structure and low defect density, a procedure to grow MOFs epitaxially on cm‐sized Si(111) single crystals is developed. The crystalline metal‐organic thin films are in high registry with the substrate's crystal lattice, as demonstrated by synchrotron‐based grazing incidence X‐ray diffraction (GI‐XRD) experiments. The corresponding reduction of MOF defect density is shown to have striking effects on the properties of these porous frameworks. The most pronounced difference concerns mass transport. An increase in the diffusion coefficient of guest molecules by one order of magnitude relative to the same MOF materials with normal defect densities is observed. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
1616301X
Volume :
34
Issue :
20
Database :
Complementary Index
Journal :
Advanced Functional Materials
Publication Type :
Academic Journal
Accession number :
177289891
Full Text :
https://doi.org/10.1002/adfm.202301535