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Low-temperature dissociation of CO2 molecules on vicinal Cu surfaces.

Authors :
Koitaya, Takanori
Shiozawa, Yuichiro
Yoshikura, Yuki
Mukai, Kozo
Yoshimoto, Shinya
Yoshinobu, Jun
Source :
Physical Chemistry Chemical Physics (PCCP); 3/28/2024, Vol. 26 Issue 12, p9226-9233, 8p
Publication Year :
2024

Abstract

The reaction of carbon dioxide on the vicinal Cu surfaces at low temperatures was investigated by infrared reflection absorption spectroscopy, scanning tunneling microscopy, X-ray photoelectron spectroscopy, and quadrupole mass spectrometry. Dissociation of CO<subscript>2</subscript> molecules into CO on the Cu(997) and Cu(977) surfaces was observed at temperatures between 80 K and 90 K, whereas it did not occur on Cu(111) under a similar condition. CO and physisorbed CO<subscript>2</subscript> were the main adsorbates during the reaction. In contrast, the amount of atomic oxygen on the surface was small. The dissociation of CO<subscript>2</subscript> was promoted by the small amount of oxygen produced by the CO<subscript>2</subscript> dissociation on the Cu surfaces. This leads to the induction period in the CO<subscript>2</subscript> reaction; the initial reaction rate on the clean Cu surfaces was low, and the coadsorbed oxygen enhanced the dissociation reactivity of CO<subscript>2</subscript>. Mass analysis of desorption species during the reaction revealed that the observed CO formation on the vicinal Cu surface is mainly caused by an oxygen-exchange reaction with residual CO in an ultra-high vacuum chamber. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
14639076
Volume :
26
Issue :
12
Database :
Complementary Index
Journal :
Physical Chemistry Chemical Physics (PCCP)
Publication Type :
Academic Journal
Accession number :
176153088
Full Text :
https://doi.org/10.1039/d3cp06336d