Review of magnetorheological finishing on components with complex surfaces.

Precision complex surfaces components are in high demand for optical imaging, high-power lasers, and medical implants. Magnetorheological finishing (MRF) is widely used in ultra-precision machining of complex surfaces components due to its advantages of low processing cost, high precision, stable removal function, no surface damage, and the ability to achieve nano-scale surface roughness and micro-scale surface shape accuracy. However, the removal efficiency of MRF is still low, the material removal mechanism is not completely clear, and the properties of magnetorheological fluid (MR fluid) need to be improved, so its application in industrial production is limited. In order to further promote the development of MRF and break through the difficulties of current MRF, it is necessary to review and summarize the MRF technology. Recent studies progress on MRF need to be more comprehensive. It is not comprehensive to introduce only several different removal theories and the appearance of compound MRF. Research progress like MR fluid, MRF tools or other also should be mentioned in a short sentence. This paper gives a detailed literature review on MRF for complex surfaces. Firstly, the principle of MRF is introduced. The finishing tools are classified based on shape and the workpieces suitable for each tool are analyzed. Some new compound MRF techniques with high machining efficiency are introduced. Then, the researches on MRF influence function and force were reviewed, and the researches on three factors affecting MRF machining performance, including process parameters, MR fluid, and magnetic pole arrangement, were reviewed. Finally, the key works of MRF technology in the future are prospected: material removal theory, preparation of high performance MR fluid, and development of novel composite MRF based on interdisciplinary and universal optimization of MRF machine tools. This paper has important reference value for researchers in MRF-related fields. [ABSTRACT FROM AUTHOR]