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Templates for Homoepitaxial Growth of 3C-SiC Obtained by Direct Bonding of Silicon Carbide Wafers of Differing Polytype.

Authors :
Mynbaeva, M. G.
Amelchuk, D. G.
Smirnov, A. N.
Nikitina, I. P.
Lebedev, S. P.
Davydov, V. Yu.
Lebedev, A. A.
Source :
Semiconductors; Jun2023, Vol. 57 Issue 6, p305-309, 5p
Publication Year :
2023

Abstract

An approach of direct bonding of SiC wafers of differing polytypes has been implemented in order to create a template for cubic 3C-SiC homo epitaxy. Hetero epitaxial 3C-SiC layers grown by chemical vapor deposition were transferred onto a hexagonal 6H-SiC wafer. The results of structural characterization showed that the quality of 3C-SiC sublimation epitaxy on the templates is comparable to the level of epitaxy of cubic silicon carbide by chemical vapor deposition method. It was confirmed that the 3C-SiC layer transferred onto the 6H-SiC substrate plays the role of a crystalline "seed" that determines cubic polytype of the overgrown SiC layer. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10637826
Volume :
57
Issue :
6
Database :
Complementary Index
Journal :
Semiconductors
Publication Type :
Academic Journal
Accession number :
176033204
Full Text :
https://doi.org/10.1134/S1063782623080109