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Subthreshold Current Suppression in ReS2 Nanosheet-Based Field-Effect Transistors at High Temperatures.

Authors :
Durante, Ofelia
Intonti, Kimberly
Viscardi, Loredana
De Stefano, Sebastiano
Faella, Enver
Kumar, Arun
Pelella, Aniello
Romeo, Francesco
Giubileo, Filippo
Alghamdi, Manal Safar G.
Alshehri, Mohammed Ali S.
Craciun, Monica F
Russo, Saverio
Di Bartolomeo, Antonio
Source :
ACS Applied Nano Materials; 12/8/2023, Vol. 6 Issue 23, p21663-21670, 8p
Publication Year :
2023

Abstract

Two-dimensional rhenium disulfide (ReS<subscript>2</subscript>), a member of the transition-metal dichalcogenide family, has received significant attention due to its potential applications in field-effect transistors (FETs), photodetectors, and memories. In this work, we investigate the suppression of the subthreshold current during the forward voltage gate sweep, leading to an inversion of the hysteresis in the transfer characteristics of ReS<subscript>2</subscript> nanosheet-based FETs from clockwise to anticlockwise. We explore the impact of temperature, sweeping gate voltage, and pressure on this behavior. Notably, the suppression in current within the subthreshold region coincides with a peak in gate current, which increases beyond a specific temperature but remains unaffected by pressure. We attribute both the suppression in drain current and the presence of peak in gate current to the charge/discharge process of gate oxide traps by thermal-assisted tunnelling. The suppression of the subthreshold current at high temperatures not only reduces power consumption but also extends the operational temperature range of ReS<subscript>2</subscript> nanosheet-based FETs. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
25740970
Volume :
6
Issue :
23
Database :
Complementary Index
Journal :
ACS Applied Nano Materials
Publication Type :
Academic Journal
Accession number :
174166428
Full Text :
https://doi.org/10.1021/acsanm.3c03685