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Photoelectron holographic evidence for the incorporation site of Se and suppressed atomic displacement of the conducting layer of La(O,F)BiSSe.

Authors :
Li, YaJun
Sun, ZeXu
Kataoka, Noriyuki
Setoguchi, Taro
Hashimoto, Yusuke
Takeuchi, Soichiro
Koga, Shunjo
Hoshi, Kazuhisa
Mizuguchi, Yoshikazu
Matsushita, Tomohiro
Wakita, Takanori
Muraoka, Yuji
Yokoya, Takayoshi
Source :
Japanese Journal of Applied Physics; 12/10/2023, Vol. 62 Issue 12, p1-6, 6p
Publication Year :
2023

Abstract

La(O,F)BiS<subscript>2- x </subscript>Se<subscript> x </subscript> is a layered material that is considered to be a candidate exotic superconductor as well as a promising thermoelectrical material. We performed soft X-ray photoelectron holography to study the Se incorporation site and the local atomic arrangement of the conducting layer. A comparison of the experimental holograms with the simulated holograms indicates that Se atoms preferentially occupy the S sites in the conducting Bi–S plane of La(O,F)BiS<subscript>2</subscript>. A comparison between the state-of-the-art holographic reconstructions of La(O,F)BiSSe and La(O,F)BiS<subscript>2</subscript> suggests that Se substitution suppresses the displacement of S atoms in La(O,F)BiS<subscript>2</subscript>. These results provide photoelectron holographic evidence for the Se incorporation site and the Se-induced suppression of in-plane disorder. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00214922
Volume :
62
Issue :
12
Database :
Complementary Index
Journal :
Japanese Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
173890447
Full Text :
https://doi.org/10.35848/1347-4065/ad079b