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Solvent Dopant-Regulated Grain Formation for Bismuth Iodide Thin-Film Photodetectors.
- Source :
- ACS Applied Nano Materials; 11/10/2023, Vol. 6 Issue 21, p19661-19670, 10p
- Publication Year :
- 2023
-
Abstract
- Simple solution-based processes to generate pinhole-free bismuth iodide (BiI<subscript>3</subscript>) thin films with large, interconnected crystal grains have remained elusive. Here, a survey of the solvent systems for BiI<subscript>3</subscript> is conducted. Using a novel binary solvent doping approach to carefully regulate the crystallization kinetics, we generate high-quality BiI<subscript>3</subscript> thin films. Our method circumvents the current requirement for unreliable postprocessing techniques such as solvent vapor annealing or antisolvent dripping. Investigations reveal that 2-methoxyethanol doped with small amounts of N-methyl-2-pyrrolidone (NMP) is the ideal combination of parent and dopant solvent providing high vapor pressure and the intermediate coordination strength necessary to successfully achieve large grain formation in a single step. To evaluate optoelectronic performance, we integrated our optimized thin films into lithographically patterned lateral photodetectors (PDs). Our PD devices show fast millisecond response times, record responsivities of ∼1.61 A/W at moderate device bias (5 V), and excellent sensitivity, with detectivity reaching 1.9 × 10<superscript>12</superscript> cm Hz<superscript>1/2</superscript> W<superscript>–1</superscript> (Jones). The high-quality BiI<subscript>3</subscript> semiconductor thin films outlined here, coupled with their ease of fabrication, enhance the development of BiI<subscript>3</subscript> optoelectronic devices and also serve as excellent template films for the fabrication of related bismuth perovskite materials. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 25740970
- Volume :
- 6
- Issue :
- 21
- Database :
- Complementary Index
- Journal :
- ACS Applied Nano Materials
- Publication Type :
- Academic Journal
- Accession number :
- 173605233
- Full Text :
- https://doi.org/10.1021/acsanm.3c03371