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Preparation and full-spectrum broad-spectrum degradation properties of BiVO4 (010) crystalline plane S-type indirect heterojunctions.
- Source :
- Journal of Materials Science: Materials in Electronics; Sep2023, Vol. 34 Issue 25, p1-17, 17p
- Publication Year :
- 2023
-
Abstract
- By using the photo-deposition technique, the Ag was selectively reduced to Ag particles that were subsequently deposited on the BiVO<superscript>+</superscript><subscript>4</subscript>(010) facet. Subsequently, the electropositive g-C<subscript>3</subscript>N<subscript>4</subscript> was deposited on the BiVO<subscript>4</subscript>(010) facet. The band bending of the interface brought on by the polarization charge and the integrated electric field worked in concert to create the BiVO<subscript>4</subscript>(010)–Ag–g-C<subscript>3</subscript>N<subscript>4</subscript> crystalline plane S-type heterojunction. As a result, carriers live longer, e<superscript>−</superscript>–h pair recombination is successfully prevented, and the heterojunction’s redox capability has enhanced. After 150 min irradiation under Vis/NIR light, the degradation rate of 20 mg/L TC by crystalline S-type heterojunctions reaches 78.79%/53.70%, respectively, and the degradation rates of heterojunction on CIP, phenol, BHA, and coumarin reach 54.96%/39.47%, 33.43%/24.79%, 35.29%/20.14%, and 40.13%/22.97%, respectively. The polarization charge of Ag is used to modulate Fermi level of BiVO<superscript>+</superscript><subscript>4</subscript> and g-C<subscript>3</subscript>N<subscript>4</subscript> semiconductors to form crystalline S-type heterojunctions on the BiVO<subscript>4</subscript> (010) crystalline surface to enhance the redox capability and broad-spectrum degradation of photocatalysts in the full spectral range. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09574522
- Volume :
- 34
- Issue :
- 25
- Database :
- Complementary Index
- Journal :
- Journal of Materials Science: Materials in Electronics
- Publication Type :
- Academic Journal
- Accession number :
- 171891887
- Full Text :
- https://doi.org/10.1007/s10854-023-11137-8