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Unveiling the origin of n-type doping of natural MoS2: carbon.

Authors :
Park, Youngsin
Li, Nannan
Jung, Daesung
Singh, Laishram Tomba
Baik, Jaeyoon
Lee, Eunsook
Oh, Dongseok
Kim, Young Dok
Lee, Jin Yong
Woo, Jeongseok
Park, Seungmin
Kim, Hanchul
Lee, Geunseop
Lee, Geunsik
Hwang, Chan-Cuk
Source :
NPJ 2D Materials & Applications; 9/5/2023, Vol. 7 Issue 1, p1-7, 7p
Publication Year :
2023

Abstract

MoS<subscript>2</subscript> has attracted intense interest in many applications. Natural MoS<subscript>2</subscript> and field-effect transistors made of it generally exhibit n-type characteristics, but its origin is unknown. Herein, we show that C is the origin of the universal n-type doping of natural MoS<subscript>2</subscript>. Photoemission spectroscopies reveal that while many MoS<subscript>2</subscript> samples with C detected are n-type, some without C exhibit p-type characteristics. The C-free, p-type MoS<subscript>2</subscript> changes to n-type over time with the concurrent appearance of C that is out-diffused from bulk, indicating that C induces the n-type doping. The C-origin is verified by C-deposition and supported by theoretical calculations. This carbon appears as nanometer-scale defects frequently observed in scanning tunneling microscopy. In addition, we propose, based on the calculations, that S vacancies are responsible for the p-type characteristics, which contrasts with the widespread belief. This work provides new perspectives on MoS<subscript>2</subscript> doping and presents a new direction for fabricating reliable MoS<subscript>2</subscript> devices. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
23977132
Volume :
7
Issue :
1
Database :
Complementary Index
Journal :
NPJ 2D Materials & Applications
Publication Type :
Academic Journal
Accession number :
171388229
Full Text :
https://doi.org/10.1038/s41699-023-00424-x