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Fabrication and Characteristics of a Zinc Oxide Tunnel Effect Transistor with High Current Output.

Authors :
Ge, Qicai
Zhu, Min
Gao, Xiaoting
Zhao, Yan
Feng, Gaoxu
Source :
Journal of Electronic Materials; Oct2023, Vol. 52 Issue 10, p6911-6918, 8p
Publication Year :
2023

Abstract

A zinc oxide (ZnO)/silver double Schottky junction tunnel effect transistor was fabricated by radio frequency magnetron sputtering. ZnO was used as the active layer of the transistor, and the electrical characteristics of the specimen were analysed. Through the analysis and calculation of the transfer characteristics, transconductance, output resistance, voltage amplification coefficient, carrier mobility, and switching current ratio, the results show that the device has excellent high-current output. When the gate bias V<subscript>GS</subscript> = 0.2 V, V<subscript>DS</subscript> = 3 V, the drain-source current I<subscript>DS</subscript> = 8.0 × 10<superscript>−3</superscript> A, reaching the milliamp level. The threshold voltage is only about 1.35 V, the switch current ratio of the device is 4.8 × 10<superscript>4</superscript>, the ZnO thin film carrier mobility is 0.33 cm<superscript>2</superscript>V<superscript>−1</superscript> s<superscript>−1</superscript>, the device has a small output resistance and large voltage amplification. Through the analysis of the output voltage-current characteristics of the device, the operating current of the transistor exhibits a tunneling effect. ZnO thin-film transistors with a vertical structure are capable of outputting large currents. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
03615235
Volume :
52
Issue :
10
Database :
Complementary Index
Journal :
Journal of Electronic Materials
Publication Type :
Academic Journal
Accession number :
171345188
Full Text :
https://doi.org/10.1007/s11664-023-10620-6