Batch Production of Wafer-Scale Monolayer MoS 2.

Monolayer MoS₂ has emerged as a highly promising candidate for next-generation electronics. However, the production of monolayer MoS₂ with a high yield and low cost remains a challenge that impedes its practical application. Here, a significant breakthrough in the batch production of wafer-scale monolayer MoS₂ via chemical vapor deposition is reported. Notably, a single preparation process enables the growth of multiple wafers simultaneously. The homogeneity and cleanliness of the entire wafer, as well as the consistency of different wafers within a batch, are demonstrated via morphology characterizations and spectroscopic measurements. Field-effect transistors fabricated using the grown MoS₂ exhibit excellent electrical performances, confirming the high quality of the films obtained via this novel batch production method. Additionally, we successfully demonstrate the batch production of wafer-scale oxygen-doped MoS₂ films via in situ oxygen doping. This work establishes a pathway towards mass preparation of two-dimensional materials and accelerates their development for diverse applications. [ABSTRACT FROM AUTHOR]