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Characteristics of InGaAs quantum dots grown on tensile-strained GaAs1-xPx.
- Source :
- Journal of Applied Physics; 5/1/2005, Vol. 97 Issue 9, p093518, 5p, 2 Black and White Photographs, 1 Diagram, 2 Charts, 6 Graphs
- Publication Year :
- 2005
-
Abstract
- InGaAs quantum dots (QDs) embedded in tensile-strained GaAs<subscript>1-x</subscript>P<subscript>x</subscript> (x=0.0–0.45) barrier layers are grown using low-pressure metal-organic chemical-vapor deposition. Variable-temperature photoluminescence (PL) measurement demonstrates that the lowest-energy QD transition can be blueshifted up to 90 nm compared with similar structures utilizing GaAs barriers. Temperature-dependent PL measurements and atomic force microscopy surface imaging show that the InGaAs QDs grown on GaAsP exhibit reduced height, which is consistent with shorter-wavelength emission. Preliminary results from broad stripe (100 μm wide) diode lasers utilizing two stacks of InGaAs QDs embedded in GaAs<subscript>0.82</subscript>P<subscript>0.18</subscript> barriers exhibit a 30% reduction in threshold current density compared with similar laser structures which have GaAs barriers. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 97
- Issue :
- 9
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 17068226
- Full Text :
- https://doi.org/10.1063/1.1884249