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Effect of interfacial diffusion on microstructure and magnetic properties of Cu/FePt bilayer thin films.

Authors :
Chen, S. K.
Yuan, F. T.
Chin, T. S.
Source :
Journal of Applied Physics; 4/1/2005, Vol. 97 Issue 7, p073902, 6p, 1 Black and White Photograph, 2 Charts, 5 Graphs
Publication Year :
2005

Abstract

The crystal structure, microstructure, and magnetic properties for a series of Cu/FePt bilayer films were investigated. The samples were prepared by depositing a Cu top layer on a highly ordered L1<subscript>0</subscript> FePt film. To promote interdiffusion, the bilayer samples were annealed at a temperature T<subscript>d</subscript> ranging from 300 to 800 °C. X-ray diffraction data indicate that observable diffusion occurs at 400 °C. The maximum coercivity thus obtained is 14.0 kOe, which is 24% larger than that of the ordered FePt film without a Cu top layer. The high H<subscript>c</subscript> can be attributed to the diffusion of copper atoms through the grain boundaries of the magnetic films, which may produce extra pinning sites for domain-wall movement. The ΔM data measured from the Henkel plots of annealed Cu/FePt films change from negative to positive values as T<subscript>d</subscript> is raised from 400 to 800 °C. This can result from the effects of demagnetization coupling and exchange coupling and is further explained from the variation of squareness ratios of hysteresis loops. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
97
Issue :
7
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
16684023
Full Text :
https://doi.org/10.1063/1.1870110