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Temperature characterization of Raman scattering in an AlGaN/GaN heterostructure.

Authors :
Chen, D.J.
Shen, B.
Wu, X.L.
Shen, J.C.
Xu, F.J.
Zhang, K.X.
Zhang, R.
Jiang, R.L.
Shi, Y.
Zheng, Y.D.
Source :
Applied Physics A: Materials Science & Processing; May2005, Vol. 80 Issue 8, p1729-1731, 3p
Publication Year :
2005

Abstract

Raman scattering from an AlGaN/GaN heterostructure was performed in the temperature range from 77 to 773 K. The first- and second-order Raman scattering of the A<subscript>1</subscript> longitudinal-optical phonon-plasmon coupled mode from an AlGaN/GaN interface as well as the Raman scattering from the GaN layer were observed. All the modes downshift, and their intensities weaken with increasing temperature. The free-carrier concentration estimated by the frequency of the coupled mode from an AlGaN/GaN interface is 7.5 times as high as that of n-AlGaN, indicating mass free-carrier transfer from the AlGaN barrier to the GaN well. Moreover, the temperature dependence of the phonon frequency is well described by an empirical formula. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09478396
Volume :
80
Issue :
8
Database :
Complementary Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Academic Journal
Accession number :
16600424
Full Text :
https://doi.org/10.1007/s00339-003-2456-2