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Physical and Structural Properties of RF Magnetron Sputtered ZnO Films.
- Source :
- Integrated Ferroelectrics; 2005, Vol. 69 Issue 1, p43-53, 11p
- Publication Year :
- 2005
-
Abstract
- Poly-crystal zinc oxide thin films with c-axis orientation have been successfully grown on the silicon substrate by r.f. magnetron sputtering technique. A systematic study has been made of the influence of substrate temperature on the film structural and optical properties. For SAW device applications, it is necessary for ZnO films to have c-axis oriented crystalline structure. Much lower FWHM values 0.24 &circle; is obtained under the substrate temperature at 100 &circle; C for gaining effective electromechanical coupling. Crystalline structures, stress, and surface morphology characteristics of the films were investigated by X-ray diffraction, scanning electron microscopy. Reflective Second Harmonic Generation was used to analyze the quality of the ZnO film, and the results from these ZnO films coincide with the X-ray pattern and SEM image. Optical transmittance measurements were carried out by UV-visible spectrophotometer. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 10584587
- Volume :
- 69
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Integrated Ferroelectrics
- Publication Type :
- Academic Journal
- Accession number :
- 16400043
- Full Text :
- https://doi.org/10.1080/10584580590897254