Impact of high-temperature Mg-implantation on defects and dopants distribution in GaN.

We have investigated the impact of high-temperature Mg-implantation in GaN layers on distribution of Mg-enriched defects using scanning transmission electron microscopy and atom probe tomography. For this, 1 × 10¹⁹ cm⁻³ Mg ions have been implanted in GaN layers at room temperature (RT) and 1000 °C, followed by annealing at 1300 °C. A smaller number of Mg-enriched defects were observed in the sample implanted at 1000 °C in comparison to the sample implanted at RT. The implantation of Mg ions at 1000 °C resulted in a higher amount of randomly distributed Mg in the GaN matrix, which, in turn, leads to more uniform and enhanced donor–acceptor pair emission, leading to higher Mg activation. [ABSTRACT FROM AUTHOR]