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MoOx layer with abundant oxygen vacancies modified on Sn-doped α-Fe2O3 film for enhanced photoelectrochemical water oxidation performance.
- Source :
- Journal of Materials Science: Materials in Electronics; May2023, Vol. 34 Issue 13, p1-13, 13p
- Publication Year :
- 2023
-
Abstract
- The photoelectrochemical (PEC) water oxidation performance of α-Fe<subscript>2</subscript>O<subscript>3</subscript> photoanode can be improved by constructing proper heterojunction to promote photo-induced carrier separation and interfacial charge transfer. Here, an optimized MoO<subscript>x</subscript> layer with abundant oxygen vacancies was modified on Sn doped α-Fe<subscript>2</subscript>O<subscript>3</subscript> film by simple spin coating and thermal reduction method to form a heterojunction with enhanced PEC performance. XPS results suggest that increased oxygen vacancy concentration in MoO<subscript>x</subscript> layers can be achieved by post annealing the samples in N<subscript>2</subscript>. PEC tests of the prepared photoanodes revealed that the optimal N<subscript>2</subscript>-annealed MoO<subscript>x</subscript>/Sn-Fe<subscript>2</subscript>O<subscript>3</subscript> photoanode with abundant oxygen vacancies possesses the best photocurrent density (1.88 mA/cm<superscript>2</superscript> at 1.23 V vs RHE), which is up to 1.84 and 8.17 times compared with Sn-Fe<subscript>2</subscript>O<subscript>3</subscript> and pristine Fe<subscript>2</subscript>O<subscript>3</subscript>, respectively. The improved PEC performance can be attributed to the enhanced band bending and built-in electric field after increasing the oxygen vacancy concentration in MoO<subscript>x</subscript>, which promoted the carrier separation and transfer. This work demonstrates that constructing heterojunction using a MoO<subscript>x</subscript> layer with abundant oxygen vacancies is an effective approach to enhance the PEC performance of α-Fe<subscript>2</subscript>O<subscript>3</subscript> photoanode. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09574522
- Volume :
- 34
- Issue :
- 13
- Database :
- Complementary Index
- Journal :
- Journal of Materials Science: Materials in Electronics
- Publication Type :
- Academic Journal
- Accession number :
- 163622795
- Full Text :
- https://doi.org/10.1007/s10854-023-10519-2