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Applications of remote epitaxy and van der Waals epitaxy.

Authors :
Roh, Ilpyo
Goh, Seok Hyeon
Meng, Yuan
Kim, Justin S.
Han, Sangmoon
Xu, Zhihao
Lee, Han Eol
Kim, Yeongin
Bae, Sang-Hoon
Source :
Nano Convergence; 4/30/2023, Vol. 10 Issue 1, p1-17, 17p
Publication Year :
2023

Abstract

Epitaxy technology produces high-quality material building blocks that underpin various fields of applications. However, fundamental limitations exist for conventional epitaxy, such as the lattice matching constraints that have greatly narrowed down the choices of available epitaxial material combinations. Recent emerging epitaxy techniques such as remote and van der Waals epitaxy have shown exciting perspectives to overcome these limitations and provide freestanding nanomembranes for massive novel applications. Here, we review the mechanism and fundamentals for van der Waals and remote epitaxy to produce freestanding nanomembranes. Key benefits that are exclusive to these two growth strategies are comprehensively summarized. A number of original applications have also been discussed, highlighting the advantages of these freestanding films-based designs. Finally, we discuss the current limitations with possible solutions and potential future directions towards nanomembranes-based advanced heterogeneous integration. [ABSTRACT FROM AUTHOR]

Subjects

Subjects :
EPITAXY

Details

Language :
English
ISSN :
21965404
Volume :
10
Issue :
1
Database :
Complementary Index
Journal :
Nano Convergence
Publication Type :
Academic Journal
Accession number :
163414514
Full Text :
https://doi.org/10.1186/s40580-023-00369-3