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Terminal Atom‐Controlled Etching of 2D‐TMDs.

Authors :
Huang, Ziwei
Deng, Wei
Zhang, Zhengwei
Zhao, Bei
Zhang, Hongmei
Wang, Di
Li, Bailing
Liu, Miaomiao
Huangfu, Ying
Duan, Xidong
Source :
Advanced Materials; 4/26/2023, Vol. 35 Issue 17, p1-11, 11p
Publication Year :
2023

Details

Language :
English
ISSN :
09359648
Volume :
35
Issue :
17
Database :
Complementary Index
Journal :
Advanced Materials
Publication Type :
Academic Journal
Accession number :
163337429
Full Text :
https://doi.org/10.1002/adma.202211252