Large‐Scale Ultra‐Robust MoS2 Patterns Directly Synthesized on Polymer Substrate for Flexible Sensing Electronics (Adv. Mater. 8/2023).

MLA

Li, Weiwei, et al. “Large‐Scale Ultra‐Robust MoS2 Patterns Directly Synthesized on Polymer Substrate for Flexible Sensing Electronics (Adv. Mater. 8/2023).” Advanced Materials, vol. 35, no. 8, Feb. 2023, p. 1. EBSCOhost, https://doi.org/10.1002/adma.202207447.

APA

Li, W., Xu, M., Gao, J., Zhang, X., Huang, H., Zhao, R., Zhu, X., Yang, Y., Luo, L., Chen, M., Ji, H., Zheng, L., Wang, X., & Huang, W. (2023). Large‐Scale Ultra‐Robust MoS2 Patterns Directly Synthesized on Polymer Substrate for Flexible Sensing Electronics (Adv. Mater. 8/2023). Advanced Materials, 35(8), 1. https://doi.org/10.1002/adma.202207447

Chicago

Li, Weiwei, Manzhang Xu, Jiuwei Gao, Xiaoshan Zhang, He Huang, Ruoqing Zhao, Xigang Zhu, et al. 2023. “Large‐Scale Ultra‐Robust MoS2 Patterns Directly Synthesized on Polymer Substrate for Flexible Sensing Electronics (Adv. Mater. 8/2023).” Advanced Materials 35 (8): 1. doi:10.1002/adma.202207447.