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Observation of Large Threshold Voltage Shift Induced by Pre-applied Voltage to SiO 2 Gate Dielectric in Organic Field-Effect Transistors.

Authors :
Guo, Yifu
Deng, Junyang
Niu, Jiebin
Duan, Chunhui
Long, Shibing
Li, Mengmeng
Li, Ling
Source :
Electronics (2079-9292); Feb2023, Vol. 12 Issue 3, p540, 9p
Publication Year :
2023

Abstract

Field-effect transistors based on organic semiconducting materials (OFETs) have unique advantages of intrinsically mechanical flexibility, simple preparation process, low manufacturing cost, and large-area preparation. Through the innovation of new material design and device structures, the performance of device parameters such as mobility, on–off current ratio, and the threshold voltage (V<subscript>TH</subscript>) of OFETs continues to improve. However, the V<subscript>TH</subscript> shift of OFETs has always been an important problem restricting their practical applications. In this work, we observe that the V<subscript>TH</subscript> of polymer OFETs with the widely investigated device structure of a SiO<subscript>2</subscript> bottom-gate dielectric is noticeably shifted by pre-applying a large gate voltage. Such a shift in V<subscript>TH</subscript> remains to a large extent, even after modifying the surface of the SiO<subscript>2</subscript> dielectric using a hexamethyldisilazane (HMDS) self-assembled monolayer. This behavior of V<subscript>TH</subscript> can be ascribed to the charge trappings at the bulk of the SiO<subscript>2</subscript>. In addition, the generality of this observation is further proven by using two other conjugated polymers including p-type PDPP3T and n-type PTzNDI-2FT, and a similar trend is obtained. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20799292
Volume :
12
Issue :
3
Database :
Complementary Index
Journal :
Electronics (2079-9292)
Publication Type :
Academic Journal
Accession number :
161818763
Full Text :
https://doi.org/10.3390/electronics12030540