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Molybdenum precursor delivery approaches in atomic layer deposition of α-MoO3.
- Source :
- Dalton Transactions: An International Journal of Inorganic Chemistry; 1/28/2023, Vol. 52 Issue 4, p902-908, 7p
- Publication Year :
- 2023
-
Abstract
- In this research work, we present a study on time-sequenced plasma-enhanced atomic layer deposition (PE-ALD) processes towards the achievement of high-quality α-MoO<subscript>3</subscript> thin films which are suitable for exfoliation. In particular, a conventional precursor injection method along with a boosted precursor delivery approach are discussed and analysed. In the latter, the proposed gas supply mechanism ensures a large number of deposited Mo atoms per unit of time, which, along with a proper thermal energy, leads to high-quality and oriented orthorhombic α-MoO<subscript>3</subscript> films. The proposed boosted approach is also compared with post growth annealing steps, resulting in more effective achievement of a highly oriented orthorhombic α-MoO<subscript>3</subscript> phase and less time consumption. [ABSTRACT FROM AUTHOR]
- Subjects :
- ATOMIC layer deposition
THIN films
UNITS of time
Subjects
Details
- Language :
- English
- ISSN :
- 14779226
- Volume :
- 52
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- Dalton Transactions: An International Journal of Inorganic Chemistry
- Publication Type :
- Academic Journal
- Accession number :
- 161481301
- Full Text :
- https://doi.org/10.1039/d2dt03702e