Back to Search Start Over

Recent accomplishments in EUV lithography patterning for multi-trigger resist.

Authors :
Popescu, C.
O'Callaghan, G.
McClelland, A.
Storey, C.
Roth, J.
Jackson, E.
Robinson, A. P. G.
Source :
Proceedings of SPIE; 9/17/2022, Vol. 12292, p122920E-122920E-8, 1p
Publication Year :
2022

Details

Language :
English
ISSN :
0277786X
Volume :
12292
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
160884726
Full Text :
https://doi.org/10.1117/12.2641787
Full Text Access
View/download PDF

Tools

Authors Abstract Subjects Details