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Aggressive Equivalent Oxide Thickness of ~0.7 nm on Si 0.8 Ge 0.2 Through HfO 2 Dielectric Direct Deposition.
- Source :
- IEEE Electron Device Letters; Oct2022, Vol. 43 Issue 10, p1605-1608, 4p
- Publication Year :
- 2022
-
Abstract
- This study demonstrated the ultralow equivalent oxide thickness (EOT) value of 0.72 nm and the high-quality high- $\kappa $ /Si0.8Ge0.2 interface on p-type Si0.8Ge0.2 with direct deposition of HfO2. The ultrathin interfacial layer (IL) thickness of ~0.4 nm was observed in the high-resolution transmission electron microscope (HRTEM) images. The high-quality interface might result from the high- $\kappa $ /Si0.8Ge0.2 interface mainly consisting of the higher Si oxidation states, verified by X-ray photoelectron spectroscopy (XPS). Thus, this study refutes the necessity of IL formation and paves the way for low-EOT Si0.8Ge0.2 devices. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07413106
- Volume :
- 43
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- IEEE Electron Device Letters
- Publication Type :
- Academic Journal
- Accession number :
- 160687601
- Full Text :
- https://doi.org/10.1109/LED.2022.3203016