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Adsorption structure deteriorating negative electron affinity under the H2O environment.

Authors :
Kashima, M.
Ishiyama, S.
Sato, D.
Koizumi, A.
Iijima, H.
Nishitani, T.
Honda, Y.
Amano, H.
Meguro, T.
Source :
Applied Physics Letters; 10/31/2022, Vol. 121 Issue 18, p1-4, 4p
Publication Year :
2022

Abstract

Photocathodes with negative electron affinity (NEA) characteristics have various advantages, such as small energy spread, high spin polarization, and ultrashort pulsing. Nitride semiconductors, such as GaN and InGaN, are promising materials for NEA photocathodes because their lifetimes are longer than those of other materials. In order to further prolong the lifetime, it is important to better understand the deterioration of NEA characteristics. The adsorption of residual gases and back-bombardment by ionized residual gases shorten the lifetime. Among the adsorbed residual gases, H<subscript>2</subscript>O has a significant influence. However, the adsorption structures produced by the reaction with H<subscript>2</subscript>O are not comprehensively studied so far. In this study, we investigated adsorption structures that deteriorated the NEA characteristics by exposing InGaN and GaAs to an H<subscript>2</subscript>O environment and discussed the differences in their lifetimes. By comparing the temperature-programmed desorption curves with and without H<subscript>2</subscript>O exposure, the generation of CsOH was confirmed. The desorption of CsOH demonstrated different photoemission behaviors between InGaN and GaAs results. InGaN recovered its NEA characteristics, whereas GaAs did not. Considering the Cs desorption spectra, it is difficult for an NEA surface on InGaN to change chemically, whereas that for GaAs changes easily. The chemical reactivity of the NEA surface is different for InGaN and GaAs, which contributes to the duration of photoemission. We have attempted to prolong the lifetime of InGaN by recovering its NEA characteristics. We found that InGaN with NEA characteristics can be reused easily without thermal treatment at high temperatures. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
121
Issue :
18
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
160042709
Full Text :
https://doi.org/10.1063/5.0125344